The Best Vaporwave Albums Guide
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작성자 Palma 작성일 25-10-14 06:51 조회 3 댓글 0본문
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Ion plating is used to deposit onerous coatings of compound supplies on instruments, adherent metal coatings, optical coatings with high densities, and conformal coatings on complex surfaces. Gardner Business Media. Archived from the original on 16 July 2017. Retrieved 10 October 2019. Ion plating makes use of energetic ion bombardment during deposition to densify the deposit and control properties of the coating such as stress and microstructure.
Grant-Jacob, James A.; Beecher, Stephen J.; Riris, Haris; Yu, Anthony W.; Shepherd, David P.; Eason, Best Vapor Robert W.; Mackenzie, Jacob I. (23 October 2017). "Dynamic control of refractive index throughout pulsed-laser-deposited waveguide development". Grant-Jacob, James A.; Beecher, Stephen J.; Prentice, Jake J.; Shepherd, David P.; Mackenzie, Jacob I.; Eason, Robert W. (June 2018). "Pulsed laser deposition of crystalline garnet waveguides at a growth price of 20 μm per hour".
Beecher, Stephen J.; Grant-Jacob, James A.; Hua, Ping; Prentice, Jake J.; Eason, Robert W.; Shepherd, David P.; Mackenzie, Jacob I.
(2017-05-01). "Ytterbium-doped-garnet crystal waveguide lasers grown by pulsed laser deposition". Grant-Jacob, James A.; Beecher, Stephen J.; Parsonage, Tina L.; Hua, Ping; Mackenzie, Jacob I.; Shepherd, David P.; Eason, Robert W. (2016-01-01). "An 115 W Yb:YAG planar waveguide laser fabricated by way of pulsed laser deposition" (PDF). Shen, J.; Gai, Zheng; Kirschner, J. (February 2004). "Growth and magnetism of metallic thin movies and multilayers by pulsed-laser deposition".
Yang, W; Araki H; Kohyama A; Thaveethavorn S; Suzuki H; Noda T (2004). "Fabrication in-situ SiC nanowires/SiC matrix composite by chemical vapor infiltration course of". It has been demonstrated that the opening concentrations can be adjusted between 1014 and 1021 cm−3 by just adjusting the alkyl beam strain and the TMGa/TEGa ratio, providing means for attaining excessive and controllable p-kind doping of GaAs.
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Tsang, W.T. (1989). "From chemical vapor epitaxy to chemical beam epitaxy". Tsang, W.T. (1987). "Chemical beam epitaxy of Ga0.47In0.53As/InP quantum wells and heterostructure gadgets". Chemical beam epitaxy was first demonstrated by W.T. Within the electron-beam methodology, the supply is heated by an electron beam with an vitality as much as 15 keV. Selective development is hard to realize using elemental source MBE as a result of group III atoms do not desorb readily after they are adsorbed.
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